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Títol: R&D networks and product innovation patterns - academic and non-academic new technology-based firms on Science Parks
Autor: Lofsten H Lindelof P
Referència: TECHNOVATION
Volum: 25 Issue: 9
Pàgines: 1025-1037
Any: 2005
Codi ISBN/ISSN: 0166-4972
Tipus de document:
Paraules clau: spin-off, new technology-based firms; Science Parks; R&D networks; product innovation
Idioma:
Enllaç: http://www.sciencedirect.com/science?_ob=ArticleURL&_udi=B6V8B-4C2R32X-1&_user=10&_rdoc=1&_fmt=&_orig=search&_sort=d&_docanchor=&view=c&_searchStrId=1125508271&_rerunOrigin=scholar.google&_acct=C000050221&_version=1&_urlVersion=0&_userid=10&md5=5df313a41b
Resum: This research has explored the R&D networks and product innovation patterns made by the NTBFs (University spin offs, USOs and corporate spin-offs, CSOs) located on Science Parks. It seems resonable to believe that firms established by those with an academic background might be expected both to perform differently and respond to different incentives from those founded by personnel from the industry. The two research propositions were empirically tested on the basis of 134 new technology-based firms (NTBFs) on Science Parks in Sweden, USOs from the academy (74 small firms) and CSOs from the private sector (60 small firms). There were no significant differences regarding growth (sales) and profitability (profit margin) between the two groups. In order to separate the performance due to the firms capability and the impact of the environment, a control variable was created. This paper, building on the resource-based theory and empirical evidence, argues that NTBFs have an interest in co-operation between the university and the Science Park firms. The survey makes it clear that the proportion of USOs and CSOs on Science Parks with links with universities is comparatively high. Seventy percent of USOs cooperates with universities and 59 percent of the CSOs. This is surprisingly high percentages of the CSOs. One finding from this research is that USOs are not able to channel investments into greater R&D outputs (Patents) than comparable firms.
Adreça: Chalmers Univ Technol, Dept Ind Dynam, SE-41296 Gothenburg, Sweden E-mail Addresses: halo@mot.chalmers.se
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